Seminars

An Inverse Problem Arising in Photolithography

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Fadil Santosa

2010-05-20
15:30:00 - 16:30:00

308 , Mathematics Research Center Building (ori. New Math. Bldg.)

Photolithography is a key process in the manufacturing of chips. In this presentation, we will start with an introduction to the subwavelength projection photolithography. The basic problem is that of optimal design. It involves creating masks through which light is projected to produce a desired intensity pattern. We will describe a formulation of this problem and its numerical implementation. We will also present a mathematical result as well as numerical examples.